New material research and development, performance optimization and sustainable development innovation
SINOMER®MADMA (2-Methyl-2-adamantyl Methacrylate) is an important monomer of matrix polymer for 193 nm photoresist.
2-Methyl-2-adamantyl Methacrylate
177080-67-0
C15H22O2
25kgs/200kgs/ drum
98% min
SINOMER®MCHMA is an important monomer.
1-Methylcylohexantyl-methacrylate
76392-14-8
C11H18O2
drum
98% min
SINOMER®MCPMAis an important monomer.
1-Methylcyclopentyl Methacrylate
178889-45-7
C10H16O2
drum
98% min
