New material research and development, performance optimization and sustainable development innovation
SINOMER®EADMA (2-Ethyl-2-adamantyl methacrylate) is an important monomer of matrix polymer for 193 nm photoresist.
2-Ethyl-2-adamantyl methacrylate
209982-56-9
C16H24O2
drum or carton
98% min
SINOMER®ECHMA is an important monomer.
1-Ethylcyclohexyl Methacrylate
274248-09-8
C12H20O2
drum
98% min
SINOMER®ECPMA is an important monomer.
1-Ethylcyclopentyl Methacrylate
266308-58-1
C11H18O2
drum
98% min
SINOMER®HAMA is an important monomer.
3-Hydroxy-1-methacryloyloxyadamantane
115372-36-6
C14H20O3
drum or carton
98% min
SINOMER® IPAMA is mainly used as a photoresist monomer.
2-isopropyl-2- adamantyl methacrylate
297156-50-4
C17H26O2
drum or carton
99%min
SINOMER®MADMA (2-Methyl-2-adamantyl Methacrylate) is an important monomer of matrix polymer for 193 nm photoresist.
2-Methyl-2-adamantyl Methacrylate
177080-67-0
C15H22O2
25kgs/200kgs/ drum
98% min
SINOMER®MCHMA is an important monomer.
1-Methylcylohexantyl-methacrylate
76392-14-8
C11H18O2
drum
98% min
SINOMER®MCPMAis an important monomer.
1-Methylcyclopentyl Methacrylate
178889-45-7
C10H16O2
drum
98% min
