Sinomer®DVE-3 is a photopolymerization monomer that can be used for UV polymerization reactions of various unsaturated systems such as coatings, inks, adhesives, etc. It is suitable for both free radical reactions and cationic systems.
The curing speed is fast, the shrinkage is small, and the conversion rate of double bonds is high in cationic systems. Recommended for cationic systems or dual curing (cation+free radical) systems, it is an ideal cationic photopolymerization monomer when combined with cycloaliphatic epoxy resins, and has low viscosity and excellent dilution at room temperature.
